Plasma-Enhanced Chemical Vapor Deposition of Indene for Gas Separation Membrane

https://doi.org/10.22146/ajche.50874

Myat Kyaw(1*), Shinsuki Mori(2), Nathaniel Dugos(3), Susan Roces(4), Arnel Beltran(5), Shunsuke Suzuki(6)

(1) Department of Chemical Engineering, Mandalay Technological University, Mandalay 05072, Myanmar; Chemical Engineering Department, De La Salle University, 2401 Taft Ave, Manila 0922, Philippines
(2) Department of Chemical Engineering, Tokyo Institute of Technology, Tokyo 152-8552, Japan
(3) Chemical Engineering Department, De La Salle University, 2401 Taft Ave, Manila 0922, Philippines
(4) Chemical Engineering Department, De La Salle University, 2401 Taft Ave, Manila 0922, Philippines
(5) Chemical Engineering Department, De La Salle University, 2401 Taft Ave, Manila 0922, Philippines
(6) Department of Chemical Engineering, Tokyo Institute of Technology, Tokyo 152-8552, Japan
(*) Corresponding Author

Abstract


Polyindene (PIn) membrane was fabricated onto a zeolite 5A substrate by using plasma-enhanced chemical vapor deposition (PECVD) at low temperature. Membrane characterization was done by taking Scanning Electron Microscopy (SEM) and FT-IR measurements and the new peak was found in the plasma-derived PIn film. Membrane performance was analyzed by checking permeability of pure gases (H2, N2, and CO2) through the membrane. PECVD-derived PIn membrane showed high gas barrier properties and selectivities of 8.2 and 4.0 for H2/CO2 and H2/N2, respectively, at room temperature


Keywords


Indene, Carbon membrane, PECVD, Gas separation

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DOI: https://doi.org/10.22146/ajche.50874

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ASEAN Journal of Chemical Engineering  (print ISSN 1655-4418; online ISSN 2655-5409) is published by Chemical Engineering Department, Faculty of Engineering, Universitas Gadjah Mada.