Plasma-Enhanced Chemical Vapor Deposition of Indene for Gas Separation Membrane

  • Myat Kyaw Department of Chemical Engineering, Mandalay Technological University, Mandalay 05072, Myanmar
  • Shinsuki Mori Department of Chemical Engineering, Tokyo Institute of Technology, Tokyo 152-8552, Japan
  • Nathaniel Dugos Chemical Engineering Department, De La Salle University, 2401 Taft Ave, Manila 0922, Philippines
  • Arnel Beltran Chemical Engineering Department, De La Salle University, 2401 Taft Ave, Manila 0922, Philippines
  • Susan Roces Chemical Engineering Department, De La Salle University, 2401 Taft Ave, Manila 0922, Philippines
  • Shunsuke Suzuki Department of Chemical Engineering, Tokyo Institute of Technology, Tokyo 152-8552, Japan
Keywords: indene, carbon membrane, PECVD, Gas separation

Abstract

Polyindene (PIn) membrane was fabricated onto a zeolite 5A substrate by using plasma-enhanced chemical vapor deposition (PECVD) at low temperature. Membrane characterization was done by taking Scanning Electron Microscopy (SEM) and FT-IR measurements and the new peak was found in the plasma-derived PIn film. Membrane performance was analyzed by checking permeability of pure gases (H2, N2, and CO2) through the membrane. PECVD-derived PIn membrane showed high gas barrier properties and selectivities of 8.2 and 4.0 for H2/CO2 and H2/N2, respectively, at room temperature

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Published
2019-06-30
How to Cite
Kyaw, M., Mori, S., Dugos, N., Beltran, A., Roces, S., & Suzuki, S. (2019). Plasma-Enhanced Chemical Vapor Deposition of Indene for Gas Separation Membrane. ASEAN Journal of Chemical Engineering, 19(1), 47-53. Retrieved from https://dev.journal.ugm.ac.id/v3/AJChE/article/view/9079
Issue
Vol 19 No 1 (2019)
Section
Articles

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